Adsorbed Layers on surfaces by H. P. Bonzel, R. Denecke, W. Eck, A. Föhlisch, G. Held, W.

By H. P. Bonzel, R. Denecke, W. Eck, A. Föhlisch, G. Held, W. Jaegermann, N. Martensson, T. Mayer, H. Over, H. P. Steinrück

Surface technological know-how is known as a comparatively younger clinical self-discipline, thinking about the actual and chemical houses of phenomena on fresh and lined sturdy surfaces, studied lower than quite a few stipulations. The adsorption of atoms and molecules on strong surfaces is, for instance, this kind of situation, attached with roughly drastic adjustments of all floor houses. An adsorption occasion is usually saw in nature and located to be of technical value in lots of business procedures. accordingly, floor technology is interdisciplinary by way of its very nature, and as such a massive middleman among primary and utilized research.

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Atomic oxygen (1×1)O (2×2)O (2×2)O (2×2)O low cov. single O (2×2)O low cov. t. O atom; energy diff. t. 25 - 1ML Al(100) Au(111) initial (2×2)O Cu(110) initial (2×1)O single O (2×2)O (2×2)O initial Cu(111) Cu(100) Fe(100) Mg(0001) Mo(110) Nb(110) Ni(111) Ni(100) Pd(110)(1×2) Pd(111) Pd(100) Pt(111) 98D3/cluster 00H1/DFT Landolt-Börnstein New Series III/42A4 Ref. p. 5 eV 97G1/DFT-GGA Rh(110) Rh(111) Rh(100) Ru(10 1 0) Ru(0001) Tc(110) V(100) Zr(0001) c(2×2)O (2×1)O (1×1)O (2×2)O 97S6/DFT 98L1, 99G1, 0H1/DFT 98C1/cluster 98L1/99H1 (DFT) 98S1/DFT 96S2, 00H1/DFT 00H1/theory 01K1/DFT 01K1/DFT 96Y1/01J1/DFT 96Y1/01J1/DFT 00H1/DFT Remarks: a) Cluster Calculations produce less reliable values for O-metal binding energies than slab calculations.

2 Adsorption of C, N, and O on metal surfaces [Ref. p. 4 Electronic properties of chemisorbed nitrogen on metal surfaces Table 12. Electronic properties of chemisorbed atomic nitrogen overlayers on metal surfaces. substrate surface Ag(111) Cr(110) 10 L N2 Cr(111) Binding energies of core and valence states Ref. 5 eV above EF, probably due to hybridization of N(2p) with Ni(d), KRIPES: flat dispersion. 3 eV, no dispersion perp. to Rh-N rows. 8 eV (on-surface) 97F1/XPS N(2p) 6 eV below EF 79S1/UPS low N coverage low N coverage c(2×2)N c(2×2)N c(2×2)N Ni(100) (2×2)N (2×2)p4g-N 1 - 1000 L 1 - 1000L W(110) (2×2)N 90N1/XPS 94W1/UPS 94W1/SXES 90N1/XPS 89K1/UPS 97F1/XPS 97F1/XPS Landolt-Börnstein New Series III/42A4 Ref.

Is constant 473 K sticking coeff. 32 eV. 2 Adsorption of C, N, and O on metal surfaces Coverage Ref. p. 95 a), b), c), f) Rh(111) Rh(100) Method Ref. 05 350 K e); direct molecular chemisorption Mol. beam, precursor mediated Mol. beam, precursor mediated TDS, XPS TDS, XPS Mol. beam Mol. beam Mol. beam, precursor mediated 300 K mechanism ambiguous stick. coeff. constant and decreases then rapidly (T = 353 K) 125 K sample temperature 258 K, 573 K sample temp. 5 ML 110 K - 150 K 300 K 100 K; stick.

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